Chemical Vapor Deposition (CVD): Methods and Technologies

Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, high-performance, solid materials in various manufacturing industries. Chapter One reviews published experimental data for thin films of silicon nitride, single-crystal diamond synthesis, and graphene preparation.

Format: Hardback
Length: 208 pages
Publication date: 17 August 2021
Publisher: Nova Science Publishers Inc

Chemical vapor deposition (CVD) is a highly effective vacuum deposition technique employed across numerous manufacturing sectors to produce high-quality, high-performance solid materials. In Chapter One, a comprehensive analysis of published experimental data regarding thin films of silicon nitride synthesized through thermal, plasma, high-density plasma, atomic layer-by-layer deposition, and hot-wire CVD methods is presented. Chapter Two delves into the utilization of CVD for the single-crystal diamond synthesis, a crucial process in the electronics industry. Chapter Three focuses on the properties of graphene and its preparation through various methods, with a particular emphasis on the classical CVD method on copper foil and the subsequent transfer of graphene onto a dielectric substrate.

Chemical Vapor Deposition (CVD)

Chemical vapor deposition (CVD) is a versatile vacuum deposition technique employed across numerous manufacturing sectors to produce high-quality, high-performance solid materials. In Chapter One, a comprehensive analysis of published experimental data regarding thin films of silicon nitride synthesized through thermal, plasma, high-density plasma, atomic layer-by-layer deposition, and hot-wire CVD methods is presented. Chapter Two delves into the utilization of CVD for the single-crystal diamond synthesis, a crucial process in the electronics industry. Chapter Three focuses on the properties of graphene and its preparation through various methods, with a particular emphasis on the classical CVD method on copper foil and the subsequent transfer of graphene onto a dielectric substrate.

Chapter One: Review of Experimental Data for Thin Films of Silicon Nitride

Chapter One provides a critical review of published experimental data for thin films of silicon nitride synthesized through thermal, plasma, high-density plasma, atomic layer-by-layer deposition, and hot-wire CVD methods. The review focuses on examining the structural, electrical, and optical properties of these films, as well as their potential applications in various industries. The data analyzed in this chapter sheds light on the advancements in CVD technology and its impact on the development of high-performance materials.

Chapter Two: Single-Crystal Diamond Synthesis for Electronics

Chapter Two describes several aspects of the use of CVD for single-crystal diamond synthesis for electronics. The chapter discusses the advantages of CVD over traditional methods such as chemical vapor deposition (CVD) and hot filament chemical vapor deposition (HFCVD) in terms of purity, size, and cost-effectiveness. It also highlights the challenges associated with CVD, such as the need for precise control of process parameters and the potential for diamond growth defects. The chapter provides an in-depth analysis of the CVD process, including the growth of diamond crystals, the selection of growth conditions, and the post-growth processing of diamond films.

Chapter Three: Properties of Graphene and its Preparation

Chapter Three focuses on the properties of graphene and its preparation through various methods, with a particular emphasis on the classical CVD method on copper foil and the subsequent transfer of graphene onto a dielectric substrate. The chapter begins by introducing the concept of graphene, a two-dimensional carbon material with unique electronic, thermal, and mechanical properties. It then discusses the preparation of graphene through different methods, including CVD, chemical exfoliation, and thermal decomposition of carbon-based materials. The classical CVD method on copper foil is described in detail, including the growth of graphene layers, the optimization of growth conditions, and the transfer of graphene onto a dielectric substrate. The chapter also explores the potential applications of graphene in electronic devices, such as transistors, sensors, and energy storage systems.

In conclusion, Chemical Vapor Deposition (CVD) is a highly effective vacuum deposition technique employed across numerous manufacturing sectors to produce high-quality, high-performance solid materials. Chapter One provides a comprehensive review of published experimental data for thin films of silicon nitride synthesized through thermal, plasma, high-density plasma, atomic layer-by-layer deposition, and hot-wire CVD methods. Chapter Two delves into the utilization of CVD for the single-crystal diamond synthesis, a crucial process in the electronics industry. Chapter Three focuses on the properties of graphene and its preparation through various methods, with a particular emphasis on the classical CVD method on copper foil and the subsequent transfer of graphene onto a dielectric substrate. The data analyzed in these chapters shed light on the advancements in CVD technology and its potential applications in various industries.

Weight: 418g
ISBN-13: 9781536199499