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Defect-Induced Magnetism in Oxide Semiconductors
Defect-Induced Magnetism in Oxide Semiconductors
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- More about Defect-Induced Magnetism in Oxide Semiconductors
Defect-Induced Magnetism in Oxide Semiconductors provides an overview of the latest advances in defect engineering to create new magnetic materials and enable new technological applications. It discusses methods of inducing magnetism in oxide semiconductors, such as pulsed laser deposition and RF sputtering, and postdeposition methods such as annealing, ion irradiation, and ion implantation. Examples and applications are provided.
Format: Paperback / softback
Length: 736 pages
Publication date: 01 May 2023
Publisher: Elsevier Science Publishing Co Inc
Defect-Induced Magnetism in Oxide Semiconductors is a comprehensive guide that delves into the cutting-edge advancements in defect engineering to develop novel magnetic materials and unlock a wide range of technological applications. In the introductory chapter, the book provides a thorough overview of the mechanisms, behavior, and theoretical foundations of magnetism in oxide semiconductors. It then explores various methods for inducing magnetism in these materials, including pulsed laser deposition and RF sputtering, which are employed to grow oxide nanostructured materials with magnetized properties.
Subsequent chapters discuss the most relevant postdeposition techniques for enhancing magnetism in oxide semiconductors, such as annealing, ion irradiation, and ion implantation. Examples of defect-induced magnetism in oxide semiconductors are presented, along with selected applications in fields such as spintronics, magnetic storage, and energy conversion.
This book serves as a valuable resource for academic researchers, practitioners, and individuals involved in research and development in the fields of materials science and engineering. It offers a comprehensive and up-to-date account of the latest developments in defect-induced magnetism, providing a solid foundation for further exploration and innovation in this rapidly evolving field.
Dimension: 229 x 152 (mm)
ISBN-13: 9780323909075
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