Oluwatobi Adeleke,Sina Karimzadeh,Tien-ChienJen
Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Machine Learning-Based Modelling in Atomic Layer Deposition Processes
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Format: Paperback / softback
Length: 354 pages
Publication date: 05 May 2025
Publisher: Taylor & Francis Ltd
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
Weight: 740g
Dimension: 234 x 156 (mm)
ISBN-13: 9781032386737
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